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2005•Journal of Materials Science Materials in ElectronicsRequires access

A comparative study of different thick photoresists for MEMS applications

E. Koukharenko, Michaël Kraft, G J Ensell, N Hollinshead

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Key concepts: Photoresist, Electroplating, Materials science, Microfabrication, Resist, Microelectromechanical systems, Fabrication, Photolithography

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