2011Unpublished venueRequires access

ESD protection consideration in nanoscale CMOS technology

Ming‐Dou Ker, Chun‐Yu Lin

Open publisher page 9 citations

Abstract

The thinner gate oxide in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of IC products. As the feature sizes in nanoscale CMOS technologies are further scaling down, the on-chip ESD protection designs are more challenging. The ESD protection considerations, including ESD design window, area efficiency, leakage current, and high-voltage tolerance, were presented in this abstract. Some possible solutions against these issues in nanoscale CMOS technologies were also included in this paper.

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What this paper is about

The thinner gate oxide in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of IC products. As the feature sizes in nanoscale CMOS technologies are further scaling down, the on-chip ESD protection designs are more challenging. The ESD protection considerations, including ESD design window, area efficiency, leakage current, and high-voltage tolerance, were presented in this abstract. Some possible solutions against these issues in nanoscale CMOS technologies were also included in this paper.

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Available abstract

The thinner gate oxide in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of IC products. As the feature sizes in nanoscale CMOS technologies are further scaling down, the on-chip ESD protection designs are more challenging. The ESD protection considerations, including ESD design window, area efficiency, leakage current, and high-voltage tolerance, were presented in this abstract. Some possible solutions against these issues in nanoscale CMOS technologies were also included in this paper.

Key concepts: CMOS, Electrostatic discharge, Robustness (evolution), Nanoscopic scale, Leakage (economics), Electronic engineering, Materials science, Gate oxide

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