Time of flight mass spectrometry of the laser produced fragments
С. С. Алимпиев, С. М. Никифоров, A. K. Dudojan, V. Y. Shevtshenko
Abstract
С. С. Алимпиев, С. М. Никифоров, A. K. Dudojan, V. Y. Shevtshenko
Abstract
The application of reflectron time of flight mass spectrometry or analyzing the products of laser induced thin films modification and YBa2 Cu3 0 _ in bulk ablat ion is discussed . The measurements of threshol Xlaser fluences and fragment velocity distribution are presented.
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The application of reflectron time of flight mass spectrometry or analyzing the products of laser induced thin films modification and YBa2 Cu3 0 _ in bulk ablat ion is discussed . The measurements of threshol Xlaser fluences and fragment velocity distribution are presented.
Key concepts: Reflectron, Mass spectrometry, Time of flight, Time-of-flight mass spectrometry, Analytical Chemistry (journal), Laser, Ion, Materials science