2003Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and PhenomenaRequires access

Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition

Hideki Sato, Hitoshi Takegawa, Yahachi Saito

Open publisher page 24 citations

Abstract

Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays. In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni) revealed that Fe gives the longest carbon nanotubes, while Co gives the carbon nanotubes with the smallest diameter. The growth of the carbon nanotubes strongly depends on the treatment time in the plasma. Field emission characteristics from the carbon nanotubes grown by the microwave plasma enhanced chemical vapor deposition are also shown.

About this research paper

What this paper is about

Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays. In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni) revealed that Fe gives the longest carbon nanotubes, while Co gives the carbon nanotubes with the smallest diameter. The growth of the carbon nanotubes strongly depends on the treatment time in the plasma. Field emission characteristics from the carbon nanotubes grown by the microwave plasma enhanced chemical vapor deposition are also shown.

Why it matters

OpenAlex reports 24 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Plasma enhanced chemical vapor deposition, which enables growth of carbon nanotubes directly onto substrates, is potentially suitable for preparing carbon nanotubes as electron sources in field emission displays. In this article, we report the growth of aligned carbon nanotubes by microwave plasma enhanced chemical vapor deposition and investigate the effect of various parameters on the growth. Comparison among three catalysts (Fe, Co, and Ni) revealed that Fe gives the longest carbon nanotubes, while Co gives the carbon nanotubes with the smallest diameter. The growth of the carbon nanotubes strongly depends on the treatment time in the plasma. Field emission characteristics from the carbon nanotubes grown by the microwave plasma enhanced chemical vapor deposition are also shown.

Key concepts: Carbon nanotube, Chemical vapor deposition, Carbon nanotube supported catalyst, Materials science, Field electron emission, Potential applications of carbon nanotubes, Carbon fibers, Chemical engineering

Related papers

Back to paper searchBrowse research topicsOriginal source
Vertically aligned carbon nanotubes grown by plasma enhanced chemical vapor deposition — Research Paper | ScholarLens