2009•Microelectronic EngineeringRequires access

Computer simulation of resist profiles at electron beam nanolithography

Katia Vutova, Eлена Колева, Georgy Mladenov, I. Kostič, Takeshi Tanaka

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Key concepts: Resist, Nanolithography, Hydrogen silsesquioxane, Electron-beam lithography, Materials science, Photoresist, Cathode ray, Penetration depth

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Computer simulation of resist profiles at electron beam nanolithography — Research Paper | ScholarLens