1995•Surface and Interface AnalysisRequires access

Characterization of plasma‐deposited styrene films by XPS and static SIMS

Graham J. Leggett, Buddy D. Ratner, John C. Vickerman

Abstract

Abstract Plasma‐polymerized styrene films were studied by static secondary ion mass spectrometry (SIMS) and x‐ray photoelectron spectroscopy (XPS). The two techniques were found to yield complementary data regarding film chemical structure. Static SIMS proved to be highly sensitive to subtle changes in surface chemistry. For example, the static SIMS spectra exhibited features due to polymer cross‐linking and unsaturation. X‐ray photoelectron spectroscopy provided a good indication of the extent of oxygen incorporation into the plasma‐deposited films and characterization of time‐dependent changes in film composition.

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Available abstract

Key concepts: X-ray photoelectron spectroscopy, Degree of unsaturation, Static secondary-ion mass spectrometry, Secondary ion mass spectrometry, Analytical Chemistry (journal), Styrene, Characterization (materials science), Chemistry