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1994•Journal of The Electrochemical SocietyOpen access

Chemical Composition of Passive Films on AISI 304 Stainless Steel

G. Lorang, M. Da Cunha Belo, A.M. Simões, M.G.S. Ferreira

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Abstract

Chemical characterization of passive films formed on AISI 304 austenitic stainless steel, in a borate/boric acid solution at pH 9.2, under various conditions of potential, temperature, and polarization time, was made by Auger electron spectroscopy combined with ion sputtering, and x‐ray photoelectron spectroscopy (XPS). The depth chemical composition, thickness, and duplex character of the passive layers were determined after processing AES sputter profiles by our quantitative approach based on the sequential layer sputtering model. Moreover, separated contributions of elements in their oxidized and unoxidized state could be disclosed from part to part of the oxide‐alloy interface. The XPS study specified the chemical bondings which take place inside the film, between Fe and oxygen (and water).

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Chemical characterization of passive films formed on AISI 304 austenitic stainless steel, in a borate/boric acid solution at pH 9.2, under various conditions of potential, temperature, and polarization time, was made by Auger electron spectroscopy combined with ion sputtering, and x‐ray photoelectron spectroscopy (XPS). The depth chemical composition, thickness, and duplex character of the passive layers were determined after processing AES sputter profiles by our quantitative approach based on the sequential layer sputtering model. Moreover, separated contributions of elements in their oxidized and unoxidized state could be disclosed from part to part of the oxide‐alloy interface. The XPS study specified the chemical bondings which take place inside the film, between Fe and oxygen (and water).

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Available abstract

Chemical characterization of passive films formed on AISI 304 austenitic stainless steel, in a borate/boric acid solution at pH 9.2, under various conditions of potential, temperature, and polarization time, was made by Auger electron spectroscopy combined with ion sputtering, and x‐ray photoelectron spectroscopy (XPS). The depth chemical composition, thickness, and duplex character of the passive layers were determined after processing AES sputter profiles by our quantitative approach based on the sequential layer sputtering model. Moreover, separated contributions of elements in their oxidized and unoxidized state could be disclosed from part to part of the oxide‐alloy interface. The XPS study specified the chemical bondings which take place inside the film, between Fe and oxygen (and water).

Key concepts: X-ray photoelectron spectroscopy, Chemical state, Sputtering, Auger electron spectroscopy, Boric acid, Materials science, Chemical composition, Alloy

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