Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film
Andrey Komlev, В. И. Шаповалов, N. S. Shutova
Abstract
Andrey Komlev, В. И. Шаповалов, N. S. Shutova
Abstract
A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.
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A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.
Key concepts: Argon, Cavity magnetron, Materials science, Titanium, Sputter deposition, Oxygen, Torr, Deposition (geology)