2009•Journal of Vacuum Science & Technology A Vacuum Surfaces and FilmsRequires access

High power impulse magnetron sputtering using a rotating cylindrical magnetron

Wouter Leroy, Stijn Mahieu, Diederik Depla, Arutiun Papken Ehiasarian

Abstract

Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm−2. For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode.

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Key concepts: High-power impulse magnetron sputtering, Cavity magnetron, Materials science, Sputter deposition, Impulse (physics), Electric arc, Plasma, Ionization