2010•Thin Solid FilmsRequires access

Effects of RF power and pressure on performance of HF-PECVD silicon thin-film solar cells

Shui‐Yang Lien, Chao‐Chun Wang, Chau-Te Shen, Yu‐Chih Ou, Yun-Shao Cho, Ko-Wei Weng, Ching-Hsun Chao, Chia‐Fu Chen, Dong‐Sing Wuu

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Key concepts: Plasma-enhanced chemical vapor deposition, Thin film, Materials science, Amorphous silicon, Silicon, Deposition (geology), Optoelectronics, Solar cell

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Effects of RF power and pressure on performance of HF-PECVD silicon thin-film solar cells — Research Paper | ScholarLens