1993•Journal of Electron Spectroscopy and Related PhenomenaRequires access

X-ray photoelectron spectroscopy characteristics of the W/TiN/Si and W/TiN/SiO2/Si structures

Sunil Kumar, D. Chopra, G. C. Moore Smith

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Key concepts: Tin, X-ray photoelectron spectroscopy, Titanium nitride, Chemical vapor deposition, Materials science, Tungsten, Nucleation, Analytical Chemistry (journal)

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X-ray photoelectron spectroscopy characteristics of the W/TiN/Si and W/TiN/SiO2/Si structures — Research Paper | ScholarLens