2001•Thin Solid FilmsRequires access

Nitrogen-doped plasma enhanced chemical vapor deposited (PECVD) amorphous carbon: processes and properties

Steven M. Smith, S. Voight, Harland G. Tompkins, Andy Hooper, A. Alec Talin, Joseph B. Vella

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Key concepts: Plasma-enhanced chemical vapor deposition, Chemical vapor deposition, Carbon film, Amorphous carbon, Thin film, Amorphous solid, Materials science, Carbon fibers