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Characteristic Study of Silicon Nitride Films Deposited by LPCVD and PECVD

Chris Yang, John Pham

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Key concepts: Plasma-enhanced chemical vapor deposition, Chemical vapor deposition, Materials science, Silicon nitride, Nitride, Silicon, Stoichiometry, Chemical engineering

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Characteristic Study of Silicon Nitride Films Deposited by LPCVD and PECVD — Research Paper | ScholarLens