Integrated Si-LDMOS transistors for 11 GHz X-Band power amplifier applications
R. Sorge, A. Fischer, Andreas Mai, Peter Schley, Jens Schmidt, Ch. Wipf, R. Pliquett, Rainer Barth
Abstract
R. Sorge, A. Fischer, Andreas Mai, Peter Schley, Jens Schmidt, Ch. Wipf, R. Pliquett, Rainer Barth
Abstract
The integration of RF NLDMOS transistors into a 0.13 μm CMOS process for operating at X-Band (8.5-10.5 GHz) frequencies with over 11 dB gain and 0.25 W/mm power density and 22% power added efficiency at 1 dB output power compression is presented. The self aligned NLDMOS was modularly integrated into IHP's 130 nm SiGeC BiCMOS platform targeting 1 W X-Band power amplifiers for radar and satellite communication applications.
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The integration of RF NLDMOS transistors into a 0.13 μm CMOS process for operating at X-Band (8.5-10.5 GHz) frequencies with over 11 dB gain and 0.25 W/mm power density and 22% power added efficiency at 1 dB output power compression is presented. The self aligned NLDMOS was modularly integrated into IHP's 130 nm SiGeC BiCMOS platform targeting 1 W X-Band power amplifiers for radar and satellite communication applications.
Key concepts: LDMOS, Amplifier, Transistor, Electrical engineering, Materials science, Optoelectronics, Power-added efficiency, CMOS