1995•Microelectronic EngineeringRequires access

Resist process to join electron beam lithography and photolithography

Lothar Bauch, M. Bo ̈ttcher, U. Jagdhold

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Key concepts: Resist, Photolithography, Electron-beam lithography, Lithography, Extreme ultraviolet lithography, Stencil lithography, Materials science, Computational lithography

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Resist process to join electron beam lithography and photolithography — Research Paper | ScholarLens