1988•Physical review. B, Condensed matterRequires access

Ambipolar density and temperature profiles of an electron-hole plasma within a semiconductor slab

A. Fourikis, G. Mahler

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Abstract

We study the spatiotemporal evolution of the electronic state within an infinitely extended silicon slab locally excited by a monochromatic laser beam. Based on transport coefficients in the classical regime, the ambipolar diffusion profiles for electron-hole pair density and temperature are calculated. In particular, we are able to deduce spatial relaxation times for the plasma.

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What this paper is about

We study the spatiotemporal evolution of the electronic state within an infinitely extended silicon slab locally excited by a monochromatic laser beam. Based on transport coefficients in the classical regime, the ambipolar diffusion profiles for electron-hole pair density and temperature are calculated. In particular, we are able to deduce spatial relaxation times for the plasma.

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Available abstract

We study the spatiotemporal evolution of the electronic state within an infinitely extended silicon slab locally excited by a monochromatic laser beam. Based on transport coefficients in the classical regime, the ambipolar diffusion profiles for electron-hole pair density and temperature are calculated. In particular, we are able to deduce spatial relaxation times for the plasma.

Key concepts: Ambipolar diffusion, Plasma, Slab, Electron, Relaxation (psychology), Excited state, Atomic physics, Diffusion

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