4H-SiC SOI-MESFET with a step in buried oxide for improving electrical performance
Hamid Amini Moghadam, Ali A. Orouji, Seyed Ehsan Jamali Mahabadi
Abstract
Hamid Amini Moghadam, Ali A. Orouji, Seyed Ehsan Jamali Mahabadi
Abstract
This paper introduces a novel 4H-SiC SOI-MESFET with a step in buried oxide (SSOI-MESFET) for improving breakdown voltage. We investigate the improvement in device performance with two-dimensional and two-carrier device simulation. Our simulation results show that breakdown voltage of SSOI-MESFET is higher than conventional Bulk-MESFET (CB-MESFET) and conventional 4H-SiC SOI-MESFET (CSOI-MESFET). In this study we have shown that saturation current of the proposed structure is higher than CB-MESFET.
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This paper introduces a novel 4H-SiC SOI-MESFET with a step in buried oxide (SSOI-MESFET) for improving breakdown voltage. We investigate the improvement in device performance with two-dimensional and two-carrier device simulation. Our simulation results show that breakdown voltage of SSOI-MESFET is higher than conventional Bulk-MESFET (CB-MESFET) and conventional 4H-SiC SOI-MESFET (CSOI-MESFET). In this study we have shown that saturation current of the proposed structure is higher than CB-MESFET.
Key concepts: MESFET, Materials science, Silicon on insulator, Optoelectronics, Breakdown voltage, Voltage, Electronic engineering, Electrical engineering