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2003•Microelectronic EngineeringRequires access

Grey scale structures formation in SU-8 with e-beam and UV

Vladimir A. Kudryashov, Xiaocong Yuan, Wai Chye Cheong, Kaladhar Radhakrishnan

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Key concepts: Resist, Photomask, Materials science, Layer (electronics), Optics, Electron-beam lithography, Beam (structure), Optoelectronics

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