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1993•Applied Physics LettersRequires access

Structure of (001) GaAs surfaces during epitaxial growth by organometallic chemical vapor deposition

Itaru Kamiya, H. Tanaka, D. E. Aspnes, M.A. Koza, Rajaram J. Bhat

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Abstract

Under typical atmospheric pressure (AP) organometallic chemical vapor deposition (OMCVD) growth conditions with trimethylgallium (TMG) and arsine sources, reflectance-difference (RD) spectra show that the (001) GaAs surface is in the d(4×4)-like state. With sufficiently high TMG and low AsH3 exposures, we observe RD spectra similar to those obtained during atomic layer epitaxy (ALE) at lower temperatures.

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What this paper is about

Under typical atmospheric pressure (AP) organometallic chemical vapor deposition (OMCVD) growth conditions with trimethylgallium (TMG) and arsine sources, reflectance-difference (RD) spectra show that the (001) GaAs surface is in the d(4×4)-like state. With sufficiently high TMG and low AsH3 exposures, we observe RD spectra similar to those obtained during atomic layer epitaxy (ALE) at lower temperatures.

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Available abstract

Under typical atmospheric pressure (AP) organometallic chemical vapor deposition (OMCVD) growth conditions with trimethylgallium (TMG) and arsine sources, reflectance-difference (RD) spectra show that the (001) GaAs surface is in the d(4×4)-like state. With sufficiently high TMG and low AsH3 exposures, we observe RD spectra similar to those obtained during atomic layer epitaxy (ALE) at lower temperatures.

Key concepts: Trimethylgallium, Arsine, Chemical vapor deposition, Group 2 organometallic chemistry, Atomic layer epitaxy, Epitaxy, Spectral line, Chemistry

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