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ChemInform Abstract: Preparation of Device‐Quality SiO2 Thin Films by Remote Plasma‐ Enhanced Chemical Vapor Deposition (PECVD): Applications in Metal‐ Oxide‐Semiconductor (MOS) Devices

G. Lucovsky

Abstract

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Available abstract

Key concepts: Chemistry, Plasma-enhanced chemical vapor deposition, Chemical vapor deposition, Oxide, Nanotechnology, Semiconductor, Plasma, Deposition (geology)