1997•Unpublished venueRequires access

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Stevenx R. Droes, Toivo T. Kodas, Mark J. Hampden‐Smith

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Key concepts: Plasma-enhanced chemical vapor deposition, Ceramic, Materials science, Chemical vapor deposition, Microelectronics, Plasma, Deposition (geology), Nanotechnology

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