2005•Thin Solid FilmsRequires access

Development of catalytic chemical vapor deposition apparatus for large size substrates

S. Osono, Makiko Kitazoe, Hideo Tsuboi, Siti Atikah Mohammad Asari, Kazuya Saito

Open publisher page 14 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

OpenAlex reports 14 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Chemical vapor deposition, Deposition (geology), Combustion chemical vapor deposition, Catalysis, Materials science, Hybrid physical-chemical vapor deposition, Ion plating, Nanotechnology

Back to paper search Browse research topics Original source

Development of catalytic chemical vapor deposition apparatus for large size substrates — Research Paper | ScholarLens