1994Unpublished venueRequires access

Chemical Vapor Deposition of Tungsten

Alfred A. Zinn

Open publisher page 15 citations

Abstract

This chapter contains sections titled: Introduction Precursors-Synthesis-Proptie Chemical Vapor Deposition (CVD) In Situ Catalysis of Tungsten Deposition Laser-Assisted Chemical Vapor Deposition (LCVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Summary and Outlook

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What this paper is about

This chapter contains sections titled: Introduction Precursors-Synthesis-Proptie Chemical Vapor Deposition (CVD) In Situ Catalysis of Tungsten Deposition Laser-Assisted Chemical Vapor Deposition (LCVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Summary and Outlook

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OpenAlex reports 15 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

This chapter contains sections titled: Introduction Precursors-Synthesis-Proptie Chemical Vapor Deposition (CVD) In Situ Catalysis of Tungsten Deposition Laser-Assisted Chemical Vapor Deposition (LCVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Summary and Outlook

Key concepts: Chemical vapor deposition, Plasma-enhanced chemical vapor deposition, Combustion chemical vapor deposition, Tungsten, Hybrid physical-chemical vapor deposition, Deposition (geology), Ion plating, Materials science

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