Bandgap bowing in BGaN thin films
A. Ougazzaden, S. Gautier, T. Moudakir, Zakaria Djebbour, Zachary Lochner, Suk Soon Choi, H. J. Kim, Jae‐Hyun Ryou, Russell D. Dupuis, A. A. Sirenko
Abstract
A. Ougazzaden, S. Gautier, T. Moudakir, Zakaria Djebbour, Zachary Lochner, Suk Soon Choi, H. J. Kim, Jae‐Hyun Ryou, Russell D. Dupuis, A. A. Sirenko
Abstract
We report on the bandgap variation in thin films of BxGa1−xN grown on AlN/sapphire substrates using metal-organic vapor phase epitaxy. Optical transmission, photoluminescence, and x-ray diffraction were utilized to characterize the materials’ properties of the BxGa1−xN films. In contrast to the common expectation for the bandgap variation, which is based on the linear interpolation between the corresponding GaN and BN values, a significant bowing (C=9.2±0.5 eV) of the bandgap was observed. A decrease in the optical bandgap by 150 meV with respect to that of GaN was measured for the increase in the boron composition from 0% to 1.8%.
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We report on the bandgap variation in thin films of BxGa1−xN grown on AlN/sapphire substrates using metal-organic vapor phase epitaxy. Optical transmission, photoluminescence, and x-ray diffraction were utilized to characterize the materials’ properties of the BxGa1−xN films. In contrast to the common expectation for the bandgap variation, which is based on the linear interpolation between the corresponding GaN and BN values, a significant bowing (C=9.2±0.5 eV) of the bandgap was observed. A decrease in the optical bandgap by 150 meV with respect to that of GaN was measured for the increase in the boron composition from 0% to 1.8%.
Key concepts: Band gap, Materials science, Wide-bandgap semiconductor, Sapphire, Bowing, Photoluminescence, Thin film, Epitaxy