A nanofactory by focused ion beam
Toshiaki Fujii, Koji Iwasaki, Masanao Munekane, T. Takeuchi, Masakatsu Hasuda, Tatsuya Asahata, Masahiro Kiyohara, Toshiharu Kogure, Yukimitsu Kijima, Takashi Kaito
Abstract
Toshiaki Fujii, Koji Iwasaki, Masanao Munekane, T. Takeuchi, Masakatsu Hasuda, Tatsuya Asahata, Masahiro Kiyohara, Toshiharu Kogure, Yukimitsu Kijima, Takashi Kaito
Abstract
A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etching and ion beam induced deposition. In order to realize greater diversity of structures with use of the FIB system, we developed a technology of making three-dimensional structures by using gas assist etching, and a precision wheel stage to be used in the focused ion beam (FIB) system. Using these technologies with the FIB system, we achieved a nano processing machine which can be called a nano milling machine or a nano lathe.
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A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etching and ion beam induced deposition. In order to realize greater diversity of structures with use of the FIB system, we developed a technology of making three-dimensional structures by using gas assist etching, and a precision wheel stage to be used in the focused ion beam (FIB) system. Using these technologies with the FIB system, we achieved a nano processing machine which can be called a nano milling machine or a nano lathe.
Key concepts: Ion beam, Focused ion beam, Beam (structure), Ion, Materials science, Optics, Physics, Quantum mechanics