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An improved fabrication technique for porous silicon
Dennis C. Diaz, M. Osmanski, H. W. Guan, Biswajit Das
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Abstract
An improved technique for fabrication of porous silicon is described. Silicon wafers of any size and shape can be anodized with this very versatile apparatus. Also, this technique is shown to be safer due to reduced HF acid handling. Overall, this equipment allows more efficient fabrication of uniform and good quality porous silicon safely on silicon wafers of variable sizes and shapes.