2001•Microelectronic EngineeringRequires access

The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS

B. Volland, H. Heerlein, I. Kostič, Ivo W. Rangelow

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Key concepts: Microelectromechanical systems, Etching (microfabrication), Dry etching, Fabrication, Reactive-ion etching, Aspect ratio (aeronautics), Materials science, Nanotechnology