1992•Thin Solid FilmsRequires access

Chemical vapor deposition precursor chemistry 1: The deposition of pure aluminum thin films from an aluminaborane precursor compound by chemical vapor deposition

John A. Glass, Shreyas S. Kher, James Timothy Spencer

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Key concepts: Chemical vapor deposition, Combustion chemical vapor deposition, Chemistry, Hybrid physical-chemical vapor deposition, Deposition (geology), Thin film, Ion plating, Aluminium