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High rate rf sputtered niobium: Effects of deposition rate on superconducting properties

F. C. Rock, C. W. Smith

Open publisher page 4 citations

Abstract

The low-temperature electric properties of niobium films deposited using an rf sputtering system, in which the deposition rate (≳1000 Å/min) and self-bias potential (∼5 kV) are higher than normally encountered, are presented. Comparison is made to existing data on single-crystal Nb films as a function of thickness. It is found that high deposition rates can be the ’’special technique’’ needed to produce high-quality Nb films.

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What this paper is about

The low-temperature electric properties of niobium films deposited using an rf sputtering system, in which the deposition rate (≳1000 Å/min) and self-bias potential (∼5 kV) are higher than normally encountered, are presented. Comparison is made to existing data on single-crystal Nb films as a function of thickness. It is found that high deposition rates can be the ’’special technique’’ needed to produce high-quality Nb films.

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Available abstract

The low-temperature electric properties of niobium films deposited using an rf sputtering system, in which the deposition rate (≳1000 Å/min) and self-bias potential (∼5 kV) are higher than normally encountered, are presented. Comparison is made to existing data on single-crystal Nb films as a function of thickness. It is found that high deposition rates can be the ’’special technique’’ needed to produce high-quality Nb films.

Key concepts: Niobium, Sputtering, Materials science, Deposition (geology), Sputter deposition, Superconductivity, Optoelectronics, Thin film

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