Different Sputtering Configurations For Coating 1,5 Ghz Copper Cavities

In the framework of the attempts to densify the sputtering discharge, two different sputtering configuration are reported: - a mixed bias magnetron sputtering technique has been explored for depositing niobium into 1,5 GHz copper cavities. Results are presented and compared with the standard CERN technique. The superconducting and high resolution morphological and mechanical properties of niobium films sputtered onto the inner walls of electropolished cavities, have been studied as a function of the deposition technique. Even if niobium films coated with the bias technique show a higher density and Tc similar to the other films, they don’t present higher RRR values. Preliminary RF tests are presented. - post Magnetron sputtering in thermoelectric emission regime have been investigated and is under improvement in order to increase the RRR values of sputtered Nb: superconducting and structural properties of the obtained films have been measured to check the technique capability and its possible application for coating cavities.