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Silicon-microstructure superconducting microbolometer infrared arrays

Burgess R. Johnson, Paul W. Kruse

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Abstract

High-temperature superconducting microbolometer silicon microstructure infrared arrays offer the potential of lowest possible production cost combined with high performance for use in infrared imaging systems. Linear arrays employing thin films of yttrium barium copper oxide have been prepared. Small two-dimensional arrays are under development. A 240 X 336 array of 50 micrometers X 50 micrometers pixels operating at 85 K at 30 frames per second with f/1 optics has a theoretical noise equivalent temperature difference of 2.0 X 10-3 deg K.

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High-temperature superconducting microbolometer silicon microstructure infrared arrays offer the potential of lowest possible production cost combined with high performance for use in infrared imaging systems. Linear arrays employing thin films of yttrium barium copper oxide have been prepared. Small two-dimensional arrays are under development. A 240 X 336 array of 50 micrometers X 50 micrometers pixels operating at 85 K at 30 frames per second with f/1 optics has a theoretical noise equivalent temperature difference of 2.0 X 10-3 deg K.

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Available abstract

High-temperature superconducting microbolometer silicon microstructure infrared arrays offer the potential of lowest possible production cost combined with high performance for use in infrared imaging systems. Linear arrays employing thin films of yttrium barium copper oxide have been prepared. Small two-dimensional arrays are under development. A 240 X 336 array of 50 micrometers X 50 micrometers pixels operating at 85 K at 30 frames per second with f/1 optics has a theoretical noise equivalent temperature difference of 2.0 X 10-3 deg K.

Key concepts: Microbolometer, Yttrium barium copper oxide, Materials science, Infrared, Bolometer, Yttrium, Microstructure, Silicon

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