1985•Microelectronic EngineeringRequires access

Submicron patterns formed by reactive ion etching

W. Pilz, T. Sponholz, Siegfried Pongratz, Hermann Mader

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Key concepts: Reactive-ion etching, Polyimide, Etching (microfabrication), Materials science, Layer (electronics), Silicon nitride, Dry etching, Silicon

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