2013Advanced materials researchOpen access

Microfluid Permittivity Measurement Based on On-Chip CPW with Finite Metal Thickness

Huan Zou, Hai Yang Wang

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Abstract

A new method of permittivity measurement based on the on-chip coplanar waveguide (CPW) with finite metal thickness without close box or microfluid channel is presented in this paper. The material under test (MUT) is directly located in the slot line of the CPW which is considered to be the strongest field distribution area. The proposed structure sample is simulated through HFSS. The simulation results agree well especially when the metal thickness is comparable with the slot line width, the errors are less than 5%.

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What this paper is about

A new method of permittivity measurement based on the on-chip coplanar waveguide (CPW) with finite metal thickness without close box or microfluid channel is presented in this paper. The material under test (MUT) is directly located in the slot line of the CPW which is considered to be the strongest field distribution area. The proposed structure sample is simulated through HFSS. The simulation results agree well especially when the metal thickness is comparable with the slot line width, the errors are less than 5%.

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Available abstract

A new method of permittivity measurement based on the on-chip coplanar waveguide (CPW) with finite metal thickness without close box or microfluid channel is presented in this paper. The material under test (MUT) is directly located in the slot line of the CPW which is considered to be the strongest field distribution area. The proposed structure sample is simulated through HFSS. The simulation results agree well especially when the metal thickness is comparable with the slot line width, the errors are less than 5%.

Key concepts: HFSS, Coplanar waveguide, Materials science, Permittivity, Chip, Line (geometry), Relative permittivity, Optoelectronics

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