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1999•Japanese Journal of Applied PhysicsOpen access

Optical Properties of Polymer-like Organic Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Toluene as the Precursor

Jongryang Joo Chun Quan, Donggeun Jung Jun Kim, Sang Youl Kim

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Abstract

Polymer-like organic thin films (POTFs) were deposited by plasma-enhanced chemical vapor deposition (PECVD) using toluene as the precursor. Refractive indices and extinction coefficients of the POTFs could be varied by changing the plasma power and the deposition temperature, which are easily and continuously controllable deposition parameters.

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Polymer-like organic thin films (POTFs) were deposited by plasma-enhanced chemical vapor deposition (PECVD) using toluene as the precursor. Refractive indices and extinction coefficients of the POTFs could be varied by changing the plasma power and the deposition temperature, which are easily and continuously controllable deposition parameters.

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Available abstract

Polymer-like organic thin films (POTFs) were deposited by plasma-enhanced chemical vapor deposition (PECVD) using toluene as the precursor. Refractive indices and extinction coefficients of the POTFs could be varied by changing the plasma power and the deposition temperature, which are easily and continuously controllable deposition parameters.

Key concepts: Plasma-enhanced chemical vapor deposition, Toluene, Combustion chemical vapor deposition, Thin film, Chemical vapor deposition, Deposition (geology), Plasma processing, Hybrid physical-chemical vapor deposition

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