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Selective etching of implanted silicon dioxide in hydrofluoric acid

Vikram Passi, Aurélie Lecestre, Emmanuel Dubois, Jean‐Pierre Raskin, 34th International Conference on Micro- and Nano-Engineering - MNE 2008

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Key concepts: Hydrofluoric acid, Etching (microfabrication), Silicon dioxide, Silicon, Materials science, Dry etching, Reactive-ion etching, Optoelectronics

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