2010•Unpublished venueRequires access

Development of in situ, at-wavelength metrology for soft x-ray nano-focusing - eScholarship

Sheng Yuan

Abstract

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of ~;;120 nm, at 1-nm soft x-ray wavelength.

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Available abstract

Key concepts: Optics, Metrology, Wavelength, Beamline, Wavefront, Physics, Materials science, Beam (structure)