2015•Unpublished venueRequires access

Advanced Process Control (APC) and Real Time Dispatch (RTD) system integration for etch depth control process in 300mm Fab

Gaurav K. Agrawal, Soon Yoong. Loh, Abemelek B. Shebi

Abstract

Most commonly used feed forward and feedback threaded control algorithms are not always sufficed to achieve the expected process control results. New smaller node sizes and complex process control requirements demand for new and embedded solutions. This paper discusses an advanced integration approach where a complete automation solution was designed and implemented by integrating Real Time Dispatching (RTD) and Advanced Process Control (APC) systems, delivering to complex custom process control requirements for a critical Deep Trench (DT) Poly Stud Recess Etch.

About this research paper

What this paper is about

Why it matters

OpenAlex reports 10 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Key concepts: Advanced process control, Process (computing), Process control, Automation, Control (management), Computer science, Control system, Work in process