1987European Solid-State Device Research ConferenceRequires access

A 18 μm 2 cell for Megabit CMOS EPROM

E. Camerlenghi, P. Caprara, G. Crisenza

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Abstract

A process technology for realzizng highly compact EPROM devices has been described; in particular the structure and the electrical characterization of a 18 μm2 memory cell has been reported, pointing out good speed performances together with good manufacturability qualities. This technology has beein verified using 64K memory, and at present it is utilized to manufacture a 1Mbit memory.

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What this paper is about

A process technology for realzizng highly compact EPROM devices has been described; in particular the structure and the electrical characterization of a 18 μm2 memory cell has been reported, pointing out good speed performances together with good manufacturability qualities. This technology has beein verified using 64K memory, and at present it is utilized to manufacture a 1Mbit memory.

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Available abstract

A process technology for realzizng highly compact EPROM devices has been described; in particular the structure and the electrical characterization of a 18 μm2 memory cell has been reported, pointing out good speed performances together with good manufacturability qualities. This technology has beein verified using 64K memory, and at present it is utilized to manufacture a 1Mbit memory.

Key concepts: Megabit, EPROM, Design for manufacturability, CMOS, Non-volatile memory, Memory cell, Computer science, Random access memory

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