Niobium and Niobium Nitride Contacts on Semiconducting Material.
E. J. Cukauskas, William G. Carter, J.M. Pond, H. S. Newman
Abstract
E. J. Cukauskas, William G. Carter, J.M. Pond, H. S. Newman
Abstract
This invention related generally to a metallization layer of niobium or niobium nitride on a semiconductor in an integrated-circuit structure, which can function from the superconducting-temperature regime to above room temperature. Niobium or niobium nitride is deposited onto a heated gallium arsenide substrate. This metallization will maintain chemical stability after high-temperature post processing. These materials provide a low-resistivity metallization suitable for Schottky contacts used over a wide operating temperature range and are superconducting at low temperatures.
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This invention related generally to a metallization layer of niobium or niobium nitride on a semiconductor in an integrated-circuit structure, which can function from the superconducting-temperature regime to above room temperature. Niobium or niobium nitride is deposited onto a heated gallium arsenide substrate. This metallization will maintain chemical stability after high-temperature post processing. These materials provide a low-resistivity metallization suitable for Schottky contacts used over a wide operating temperature range and are superconducting at low temperatures.
Key concepts: Niobium nitride, Niobium, Materials science, Nitride, Optoelectronics, Metallurgy, Superconductivity, Gallium arsenide