Circuit-level simulation of CDM-ESD and EOS in submicron MOS devices
S. Ramaswamy, Erhong Li, Elyse Rosenbaum, Sung‐Mo Kang
Abstract
S. Ramaswamy, Erhong Li, Elyse Rosenbaum, Sung‐Mo Kang
Abstract
In this paper, we present a compact electrothermal device model which can be used to simulate NMOS devices operating in the snapback regime. By incorporating temperature dependencies in the device model and using the electrothermal circuit simulator iETSIM, we are able to simulate the second breakdown of NMOS devices under EOS stress. The NMOS model also incorporates the finite breakdown time effect which is important for simulating charge device model (CDM) ESD stress events.
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In this paper, we present a compact electrothermal device model which can be used to simulate NMOS devices operating in the snapback regime. By incorporating temperature dependencies in the device model and using the electrothermal circuit simulator iETSIM, we are able to simulate the second breakdown of NMOS devices under EOS stress. The NMOS model also incorporates the finite breakdown time effect which is important for simulating charge device model (CDM) ESD stress events.
Key concepts: Snapback, NMOS logic, Electrostatic discharge, Stress (linguistics), Materials science, Electronic engineering, Semiconductor device modeling, Electronic circuit simulation