MRAM with improved magnetic tunnel junction material
Hiroshi Kano, K. Bessho, Yutaka Higo, Kazuhiro Ohba, Mitsuyo HASHIMOTO, Takahiro Mizuguchi, Masanori Hosomi
Abstract
Hiroshi Kano, K. Bessho, Yutaka Higo, Kazuhiro Ohba, Mitsuyo HASHIMOTO, Takahiro Mizuguchi, Masanori Hosomi
Abstract
Summary form only given. Increasing output and decreasing switching field distribution are very important for the development of magnetic tunnel junction (MTJ) materials, in order to achieve a high capacity MRAM. We introduce an amorphous MTJ material with excellent characteristics, which is evaluated through the MRAM/MTJ test element groups (TEG) with a MOS circuit.
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Summary form only given. Increasing output and decreasing switching field distribution are very important for the development of magnetic tunnel junction (MTJ) materials, in order to achieve a high capacity MRAM. We introduce an amorphous MTJ material with excellent characteristics, which is evaluated through the MRAM/MTJ test element groups (TEG) with a MOS circuit.
Key concepts: Magnetoresistive random-access memory, Tunnel magnetoresistance, Materials science, Amorphous solid, Optoelectronics, Tunnel junction, Engineering physics, Electrical engineering