2003Unpublished venueRequires access

Silicon‐Germanium Heterojunction Bipolar Transistors

P. Ashburn

Open publisher page 396 citations

Abstract

This chapter contains sections titled: Introduction Bandgap Engineering Collector Current, Base Current and Gain Enhancement Cut-off Frequency Device Design Trade-offs in a SiGe HBT Graded Germanium Profiles Boron Diffusion in SiGe HBTs Strain Relaxation and Strain Compensated Si1−x−yGexCy References

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What this paper is about

This chapter contains sections titled: Introduction Bandgap Engineering Collector Current, Base Current and Gain Enhancement Cut-off Frequency Device Design Trade-offs in a SiGe HBT Graded Germanium Profiles Boron Diffusion in SiGe HBTs Strain Relaxation and Strain Compensated Si1−x−yGexCy References

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OpenAlex reports 396 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

This chapter contains sections titled: Introduction Bandgap Engineering Collector Current, Base Current and Gain Enhancement Cut-off Frequency Device Design Trade-offs in a SiGe HBT Graded Germanium Profiles Boron Diffusion in SiGe HBTs Strain Relaxation and Strain Compensated Si1−x−yGexCy References

Key concepts: Heterojunction bipolar transistor, Bipolar junction transistor, Germanium, Silicon-germanium, Optoelectronics, Materials science, Heterojunction, Heterostructure-emitter bipolar transistor

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