The Transient State Model of Cluster Tools in Semiconductor Manufacturing
Xiuhong Zheng, Kefei Zhang
Abstract
Xiuhong Zheng, Kefei Zhang
Abstract
At present, cluster tools processing 450mm wafer are increasing used in modern semiconductor wafer fabrication facilities. The little batch sizes and mix-wafer processing bring out more transient behavior in 450mm wafer manufacturing. This paper presents the transient model of parallel and serial cluster tools respectively. The model is helpful to understand the transient behavior and evaluate the cycle time.
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At present, cluster tools processing 450mm wafer are increasing used in modern semiconductor wafer fabrication facilities. The little batch sizes and mix-wafer processing bring out more transient behavior in 450mm wafer manufacturing. This paper presents the transient model of parallel and serial cluster tools respectively. The model is helpful to understand the transient behavior and evaluate the cycle time.
Key concepts: Wafer, Transient (computer programming), Semiconductor device fabrication, Semiconductor device modeling, Wafer fabrication, Cluster (spacecraft), Semiconductor, Transient state