Hiroaki Oizumi, Iwao Nishiyama, Hiromasa Yamanashi, Ei Yano, Shinji Okazaki
Abstract
In this work, we have introduced and investigated a micro-field exposure system for EUV lithography (EUVL) at an exposure wavelength of 13.5 nm using 20:1 Schwarzschild optics. The resolution limit of this exposure system was evaluated by experimental pattern replications.
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In this work, we have introduced and investigated a micro-field exposure system for EUV lithography (EUVL) at an exposure wavelength of 13.5 nm using 20:1 Schwarzschild optics. The resolution limit of this exposure system was evaluated by experimental pattern replications.
Key concepts: Extreme ultraviolet lithography, Lithography, Next-generation lithography, Wavelength, Optics, Photolithography, Materials science, Optoelectronics