2015•Elsevier eBooksRequires access
Deep Reactive Ion Etching
Franz Laermer, Sami Franssila, Lauri Sainiemi, Kai Kolari
Open publisher page 69 citations
Abstract
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Franz Laermer, Sami Franssila, Lauri Sainiemi, Kai Kolari
Abstract
An abstract is not available in the OpenAlex record for this paper.
OpenAlex reports 69 citations for this work. Citation counts describe recorded attention and do not establish research quality.
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Key concepts: Deep reactive-ion etching, Reactive-ion etching, Wafer, Etching (microfabrication), Materials science, Silicon, Notching, Dry etching