2015Unpublished venueRequires access

Near Field Optical Measurements of Silicon Waveguide in Mid-IR Regime Using Scanning Thermal Microscopy

Meir Y. Grajower, Yoel Sebbag, Alex Naiman, Boris Desiatov, Uriel Levy

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Abstract

We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

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What this paper is about

We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

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Available abstract

We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

Key concepts: Near-field scanning optical microscope, Nanophotonics, Silicon, Optical microscope, Materials science, Infrared microscopy, Microscopy, Optics

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