JG Wilder, Ian M. Thomas
Abstract
Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl4 and H2O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm2, at 1.06 μm, 1 ns.
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Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl4 and H2O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm2, at 1.06 μm, 1 ns.
Key concepts: Chemical vapor deposition, Materials science, Combustion chemical vapor deposition, Substrate (aquarium), Coating, Deposition (geology), Thin film, Chemical engineering