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2023•RSC AdvancesOpen access

Suppression of the redox reaction between the IGZO surface and the reducing agent TMA using fluorine oxidizing agent treatment

Yuseong Jang, Jin-Kyu Lee, Jinsung Mok, Junhyeong Park, Seung Yoon Shin, Soo‐Yeon Lee

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Abstract

process, the chemical reduction reaction of the IGZO surface was effectively alleviated, resulting in a defect-passivated and sharp interface owing to the strong oxidizing nature of the fluorine.

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process, the chemical reduction reaction of the IGZO surface was effectively alleviated, resulting in a defect-passivated and sharp interface owing to the strong oxidizing nature of the fluorine.

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OpenAlex reports 14 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

process, the chemical reduction reaction of the IGZO surface was effectively alleviated, resulting in a defect-passivated and sharp interface owing to the strong oxidizing nature of the fluorine.

Key concepts: Oxidizing agent, Reducing agent, Redox, Chemistry, Oxygen, Fluorine, Deposition (geology), Combinatorial chemistry

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