Kurt Ronse
Abstract
This article describes all the steps that need to be taken to develop a high volume manufacturing process for advanced EUV scanners. It covers EUV masks, EUV pellicles, EUV wafer materials such as EUV resists, underlayers,… Also the metrology needs are covered.
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This article describes all the steps that need to be taken to develop a high volume manufacturing process for advanced EUV scanners. It covers EUV masks, EUV pellicles, EUV wafer materials such as EUV resists, underlayers,… Also the metrology needs are covered.
Key concepts: Extreme ultraviolet lithography, Wafer, Metrology, Lithography, Resist, Materials science, Extreme ultraviolet, Optics