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Five Mirror System Derived from the Numerical Solutions of All Zero 3rd-Order Aberrations and Zero 5th-Order Spherical Aberration for Deep-Ultraviolet Optical Lithography

Dong‐Hee Lee, Hong Jin Kong, Sang Soo Lee

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Key concepts: Zero order, Zero (linguistics), Optics, Physics, Order (exchange), Spherical aberration, Extreme ultraviolet lithography, Ultraviolet

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Five Mirror System Derived from the Numerical Solutions of All Zero 3rd-Order Aberrations and Zero 5th-Order Spherical Aberration for Deep-Ultraviolet Optical Lithography — Research Paper | ScholarLens